The diffusionconstants found in this work are in good agreement with those determined by fuller and ditzenberger and an order of magnitude less than those reported in another investigation.
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Hence aluminium based alloys and composites are particularly difficult to diffusion bond.
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The diffusionof aluminuminto siliconhas been reinvestigated to clear up certain discrepancies in the existing aluminumdata.
Tensile strength hardness heat treatability ductility elongation and more.
Aluminum perhaps most difficult material to diffusion bond.
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Aluminum as the fastest diffusing acceptor dopant in silicon is commonly used for the fabrication of power semiconductors with p n junction depths ranging from some microns to more than a hundred microns.
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The presence of stable oxide films on the faying surfaces of some materials is one of the major barriers in achieving high strength and reliable diffusion bonds.
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